Correlation Of Nitride Spacer Plasma Damage Results From Conventional Gate Capacitor Electrical Tests And A New, Non-contact Approach

發表於: International Symposium on Plasma Process-Induced Damage, 1997.

年: 1997

作者: M.W. Goss, A. Findlay

CapacitorsetchingPlasma applicationsPlasma devicesPlasma diagnosticsPlasma materials processingPlasma measurementsPlasma stabilityPulse measurementsTesting

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