High Resolution Mapping of Sheet Resistance Reveal Implanter or Anneal Non-Uniformities

发布到: SEMI Seminars, July 17 to 19, 2007, San Francisco, USA, West Coast Junction Technology Group, USJ metrology seminar

年: 2007

作者: C. Kohn, E. Don, P. Tüttő, A. Pap, T. Pavelka

sheet resistanceultra shallow implantsjunction photovoltage technique

• Semilab’s Development of the JPVMeasurement Technique

• Simple Theory of Operation• Sample Measurements

• Performance Variation in JPV Systems

• Additional Wafer Maps• Summary