1995 • Fourth International Symposium on Cleaning Technology in Semiconductor Device, 1995

Monitoring of Fe Contamination on Si Surfaces Using Non-Contact Surface Charge Profiler

主题

Surface Charge Profiler (SCP)Fe concentrationSi surfacesNon-Contact Measurement

P. Roman, I. Kashkoush, R.E. Novak, E. Kamieniecki, J. Ruzyllo

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