2007 • International Conference on Frontiers of Characterization and Metrology, 2007

Small Signal Surface Photo Voltage (SPV) measurement has become a widely accepted metrology for measuring resistivity of epitaxial and Czochralski wafers. For this metrology technique there are currently no Standard Reference Matertials (SRMs®) as defined by the National Institute of Standards and Technology (NIST). This paper will present a method for creating a NIST traceable standard for SPV measurement by further processing NIST 100 mm diameter silicon resistivity, SRM 2543 wafers.
A. Bertuch, K. Steeples
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