RFプラズマ処理シリコン上のショットキーダイオードのバリスティック電子放出顕微鏡観察
著者: L. Quattropani, K. Solt, P. Niedermann, I. Maggio-Aprile, O. Fischer, T. Pavelka
トピック: Schottky diode; RF plasma treated silicon


AFM-2000 原子間力顕微鏡
著者: L. Quattropani, K. Solt, P. Niedermann, I. Maggio-Aprile, O. Fischer, T. Pavelka
トピック: Schottky diode; RF plasma treated silicon
著者: Katalin Csonti, Csilla Fazakas, Kinga Molnár, Imola Wilhelm, István A. Krizbai, Attila G. Végh
トピック: adhesion assay; Zeiss AFM; single-cell force spectroscopy
著者: D. Marinskiy, P. Edelman, A.D. Snider
トピック: Kelvin force microscopy; corona charge; concentration profile; surface diffusion
著者: Dmitriy Marinskiy, Patrick Polakowski, Jacek Lagowski, Marshall Wilson, Piotr Edelman, Johannes Müller
トピック: corona - Kelvin; Non-Contact Measurement; THIN FILM CHARACTERIZATION
著者: P.M. Nagy, D. Aranyi, P. Horváth, G. Pető, E. Kálmán
トピック: nanoindentation; Ion Implantation; mechanical properties; AFM
著者: Bálint Szentpéteri; Albin Márffy; Máté Kedves; Endre Tóvári; Bálint Fülöp; István Kükemezey; András Magyarkuti; Kenji Watanabe; Takashi Taniguchi; Szabolcs Csonka; Péter Makk
トピック: Pressure effects; Quantum Hall effect; Spin-orbit coupling; Weak antilocalization; Bilayer graphene; Graphene; Heterostructures; Transition metal dichalcogenides; Shubnikov-de
AFM-2000 原子間力顕微鏡