Effects of Ion Channeling and Co-implants on Ion Ranges and Damage in Si: Studies with PL, SRP, SIMS and MC models
Author: Samu Viktor, Kerekes Árpád, Pongrácz Anita, Durkó Zsolt
Topic: microPL; JPV; photo-modulated reflectance
Contact us for Information and Pricing
Get expert advice and tailored solutions for your research needs

• Process control: Advanced process monitoring and tuning in semiconductor fabs
• Failure analysis: Accurate dopant and resistivity profiling for Si device troubleshooting
• Research & Development: Profiling of multilayer and compound semiconductor structures
• Characterization: Depth profiling of junctions, transition zones, and multilayer stacks
SRP-2100 / SRP-2100i Spreading Resistance Profiling
Author: Samu Viktor, Kerekes Árpád, Pongrácz Anita, Durkó Zsolt
Topic: microPL; JPV; photo-modulated reflectance
Author: E. E. Najbauer, L. Sinkó, Sz. Biró, Z. Durkó, P. Basa
Topic: carrier density; epitaxial layer; semiconductor; Silicon (Si); SRP-2100; SRP; FTIR REFLECTOMETRY
SRP-2100 / SRP-2100i Spreading Resistance Profiling